Chemical Vapour Deposition Systems

QrystalTM is a research grade chemical vapour deposition system, with 12 independent temperature zones, each capable of reaching temperatures upto 1150 °C. It has an inbuilt precision mass flow controller allowing controlled injection of upto 4 gases. A back pressure regulator allows a fixed controlled pressure to be maintained throughout the deposition chamber.

Product Info



Specifications

Furnace : QBAKE-1100-3

  • Independent Heating Zones : 12
  • Maximum Temperature : 1150 °C for transient, 1100 °C for continuous operation
  • Uniform Temperature Zone Length : 200 mm
  • Temperature Uniformity : Better than ±5 °C within a zone
  • Heater Wire Material : Kanthal
  • Process Tube Material : Quartz
  • Process Tube Diameter : ID = 45 mm, OD = 48 mm
  • Embedded Temperature Sensor : K-type Thermocouple

Temperature Controller : TCON-12

  • Sensor Channels : 16
  • Sensor Type : K-type Thermocouple (or PT100)
  • Independent Control Loops : 12
  • Control Algorithm : Floating Point P-I-D
  • Temperature Stability : Better than 0.1 °C
  • PID Auto-tune : Yes
  • Heater Drive : 220V, 50 Hz

Vacuum System : VAC-10E-2

  • Pump Type : 2-stage, Rotary Pump
  • Pump Throughput : 15 m3/hour
  • Ultimate Vacuum : 10m-3 mBar
  • Vacuum Sensor : Pirani Gauge and ±15 psi tube pressure sensor mounted at the end of the quartz tube
  • Chamber Isolation : Butterfly Valve

Mass Flow Controller : MF02

  • Number of Channels : 4
  • Channel 1, 2 : 0-1000 sccm
  • Auxilliary Valves : 2/channel, one in series for true shutoff, one in parallel for flushing
  • Flow Stability : Better than 0.1% of full scale

 

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